Developing method and apparatus for performing development processing properly and a solution processing method enabling enhanced uniformity in the processing

摘要

A substrate processing apparatus and method provide for exhausting air from a first peripheral region α around a substrate undergoing processing, and for exhausting air from a second peripheral region β between the first peripheral region and the substrate. The method reduces the effects of air flow on a developing solution on the substrate, and enables the developing solution to act effectively on the exposed resist on the substrate.