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Method of preparing a film layer-by-layer using plasma enhanced atomic layer deposition
Method of preparing a film layer-by-layer using plasma enhanced atomic layer deposition
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机译:使用等离子体增强原子层沉积逐层制备膜的方法
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摘要
A method for forming a thin film on a substrate layer by layer using plasma enhanced atomic layer deposition is described. The method comprises using a low power reduction step for at least one cycle in order to substantially avoid partial layer film growth, followed by using a high power reduction step for each cycle thereafter in order to increase deposition rate.
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