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METHOD FOR MANUFACTURING ACTIVE ELEMENTS HAVING p-n OR n-p BARRIERS BASED ON InAs-InGaAs

机译:基于InAs-InGaAs的具有p-n或n-p阻挡层的有源元件的制造方法

摘要

A method for manufacturing active elements having -n- or n-p- barriers based on InAs-nGaAs includes preparation of saturated solution-melt from indium-gallium-arsenic, setting it in contact with front face of an indium arsenide packing, forced cooling a system, formation of -n- or n-p- barriers. Preparation of saturated solution-melt of the same composition is fulfilled at the same time on two packing made of indium arsenide of different type of conductivity. One solution-melt is unalloyed and an auxiliary one, another solution-melt is alloyed and being a process solution. Formation of an active element with -n- or n-p- barriers is realized on one of packing, which contacts with the process solution.
机译:一种基于InAs-nGaAs的具有-n-或np-势垒的有源元件的制造方法,包括从铟镓砷中制备饱和溶液熔体,使其与砷化铟填料的正面接触,强制冷却系统,形成-n-或np-势垒。在两种不同导电类型的砷化铟制成的填料上同时完成相同组成的饱和溶液熔体的制备。一种溶液熔体是非合金的,而另一种是辅助溶液,另一种溶液熔体是合金的,是一种工艺溶液。具有-n-或n-p-势垒的活性元素的形成是在与工艺溶液接触的一种填料上实现的。

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