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HARDFACING COMPOSITIONS AND HARDFACING COATINGS FORMED BY PULSED PLASMA-TRANSFERRED ARC

机译:脉冲等离子体转移弧形成的硬化成分和硬化涂层

摘要

A new hardfacing composition is disclosed. In addition, a pulsed plasma transferred arc method for depositing hardfacing material with a higher content of carbide and lower dilution by a substrate metal is disclosed. The disclosed method produces a hardfacing coating which has a strong metallurgical bond to the substrate metal. The method includes the following steps: (1) establishing a transferred plasma arc between an electrode and an area of a work piece, (2) optionally preheating the work piece to at least 250°F, (3) forming a plasma column of inert gas in the arc by passing an electrical current between the electrode and the work piece, (4) feeding a stream of hardfacing material in powder form into the plasma column, and (5) pulsing the current between a pre-selected high pulse current value and low pulse current value while feeding the powdered hardfacing material. In this method, the low pulse current is selected to be sufficiently high to melt at least one component of the hardfacing material. The pulse rate and the high pulse current are selected to minimize the formation of a weld pool on the metal substrate during the hardfacing process. This method has applications in hardfacing any metallic work piece which requires wear resistance or erosion resistance. This method is especially effective in hardfacing roller cone surfaces and the milled teeth of a rock bit for erosion and wear protection.
机译:公开了一种新的表面硬化组合物。另外,公开了一种脉冲等离子体转移电弧法,该方法用于沉积具有较高碳化物含量和较低的被基底金属稀释的表面硬化材料。所公开的方法产生了与表面金属具有强冶金结合的表面硬化涂层。该方法包括以下步骤:(1)在电极和工件区域之间建立转移的等离子弧;(2)可选地将工件预热到至少250°F;(3)形成惰性的等离子柱通过在电极和工件之间通过电流,在电弧中产生气体;(4)将粉末形式的表面硬化材料流送入等离子柱,以及(5)在预选的高脉冲电流值之间产生脉冲电流送入粉末堆焊材料时脉冲电流值低。在这种方法中,将低脉冲电流选择为足够高以熔化表面硬化材料的至少一种成分。选择脉冲速率和高脉冲电流以最小化在堆焊过程中在金属基板上形成的熔池。该方法可用于需要耐磨性或耐蚀性的任何金属工件的表面硬化处理。该方法特别适用于对圆锥滚子表面和钻头的磨齿进行表面硬化处理,以防腐蚀和磨损。

著录项

  • 公开/公告号CA2258448C

    专利类型

  • 公开/公告日2008-07-29

    原文格式PDF

  • 申请/专利权人 SMITH INTERNATIONAL INC.;

    申请/专利号CA19992258448

  • 申请日1999-01-13

  • 分类号C23C4/02;B23K9/28;B23K10/02;C22C19/07;C22C29/02;C23C4/10;E21B10/08;E21B10/50;

  • 国家 CA

  • 入库时间 2022-08-21 20:04:03

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