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OPTICAL LITHOGRAPHY METHOD FOR PATTERNING LINES OF EQUAL WIDTH
OPTICAL LITHOGRAPHY METHOD FOR PATTERNING LINES OF EQUAL WIDTH
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机译:等宽线绘制的光学光刻技术
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摘要
A composite patterning technique may include two lithography processes. A first lithography process may use interference lithography to form a continuous pattern of lines of substantially equal width on a photoresist. A second lithography process may use one or more non-interference lithography techniques, such as optical lithography, imprint lithography and electron-beam lithography, to break continuity of the patterned lines and form desired integrated circuit features.
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