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PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM FOR FORMING CARBON NANOTUBES
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM FOR FORMING CARBON NANOTUBES
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机译:用于形成碳纳米管的等离子体增强化学气相沉积系统
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摘要
An embodiment of a system for forming carbon nanotubes (CNTs) using plasma enhanced chemical vapor deposition (PECVD) uses one or more of RF and DC power supplies coupled to electrodes in various configurations within a process chamber of the system. By application of a sufficient DC voltage to one or more electrodes, the system allows for growing CNTs that can be straighter and have improved electrical performance characteristics.
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