首页> 外国专利> IMPROVED SENSING CAPACITANCE IN COLUMN SAMPLE AND HOLD CIRCUITRY IN A CMOS IMAGER AND IMPROVED CAPACITOR DESIGN

IMPROVED SENSING CAPACITANCE IN COLUMN SAMPLE AND HOLD CIRCUITRY IN A CMOS IMAGER AND IMPROVED CAPACITOR DESIGN

机译:CMOS成像器中柱状样品和保持电路中的传感电容得到改善,并且电容器设计得到改善

摘要

Improved designs for a capacitor, and particularly the sensing and references capacitors used In a column sampl-and-hold circuitry in a CMOS imager, are disclosed that minimize layout area In one embodiment, an additional plate layer (e g, formed in metal 1) is provided above the traditional poly 2-poly 1 capacitor, which additional plate is shorted to traditional poly 1 bottom plate This adds an additional area capacitance (CaI) which Is additive to the capacitance formed by the poly 2-poly 1 capacitor (Cp) to increase the total capacitance, which thus allows the capacitor to be made smaller in layout area In another embodiment, an additional piece of metal 1 contacts the poly 2 top capacitor plate, such that a sidewall capacitance Is defined between the sidewalls of the metal 1 pieces, which is again additive to the total capacitance These sidewalls can be interdigitized to increase the area of the sidewall capacitance.
机译:公开了一种电容器的改进设计,尤其是在CMOS成像器的列放大和保持电路中使用的传感电容器和参考电容器的改进设计,该设计使布局面积最小化。在一个实施例中,附加的板层(例如,以金属1形成)在传统的poly 2-poly 1电容器上方提供了一个电容,该附加板与传统的poly 1底板短接。这增加了一个额外的面积电容(CaI),该电容与由poly 2-poly 1电容器(Cp)形成的电容相加以增加总电容,从而使电容器的布局面积更小。在另一个实施例中,另一片金属1接触多晶硅2顶部电容器板,从而在金属1的侧壁之间限定了侧壁电容。块,这再次增加了总电容。这些侧壁可以进行叉指化以增加侧壁电容的面积。

著录项

  • 公开/公告号WO2008014106A2

    专利类型

  • 公开/公告日2008-01-31

    原文格式PDF

  • 申请/专利权人 MICRON TECHNOLOGY INC.;AY SUAT UTKU;

    申请/专利号WO2007US73060

  • 发明设计人 AY SUAT UTKU;

    申请日2007-07-09

  • 分类号H01L27;

  • 国家 WO

  • 入库时间 2022-08-21 20:01:13

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