首页>
外国专利>
PATTERNING OF MECHANICAL LAYER IN MEMS TO REDUCE STRESSES AT SUPPORTS
PATTERNING OF MECHANICAL LAYER IN MEMS TO REDUCE STRESSES AT SUPPORTS
展开▼
机译:MEMS中机械层的图案化以减少支撑处的应力
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method of fabricating a MEMS device includes the formation of support posts having horizontal wing portions at the edges of the post. A mechanical layer is deposited over the support posts and portions of the mechanical layer overlying portions of the support post other than the horizontal wing portions are etched away. A resultant MEMS device includes a mechanical layer overlying at least a portion of the horizontal wing portions of the underlying support structures.
展开▼