首页> 外国专利> COVER WAFER OR COMPONENT COVER, WAFER PART OR COMPONENT THAT CAN BE INSERTED USING MICROSYSTEMS TECHNOLOGY, AND SOLDERING METHOD FOR CONNECTING CORRESPONDING WAFER OR COMPONENT PARTS

COVER WAFER OR COMPONENT COVER, WAFER PART OR COMPONENT THAT CAN BE INSERTED USING MICROSYSTEMS TECHNOLOGY, AND SOLDERING METHOD FOR CONNECTING CORRESPONDING WAFER OR COMPONENT PARTS

机译:可使用微系统技术插入的盖晶圆或零件盖,晶圆零件或零件,以及用于连接对应的晶圆或零件的焊接方法

摘要

The invention relates to a cover wafer with a core and with an inside, whereby the inside has one or more annular outer areas, (an) annular area(s), which inwardly adjoin(s) the outer area(s), and has (a) inner area(s), and to a component cover with only one annular outer area on its inside. The invention is characterized in that at least area(s) has/have a buffer layer, which has a wetting angle of 35° for a metallic eutectic solution that melts in a range of 265° C. to 450° C. The invention also relates to a component cover having one of the areas which has said buffer layer in a comparable manner. The invention additionally relates to a wafer component or to a component, which can be inserted using microsystem technology and which has a cover wafer or component cover applied with the aid of a solder material, and to a method for the production thereof.
机译:本发明涉及一种具有芯和内部的覆盖晶片,其中,内部具有一个或多个环形的外部区域,一个或多个环形区域,该环形的区域向内邻接该外部区域,并且具有(a)内部区域,并且在内部只有一个环形外部区域的部件盖上。本发明的特征在于,至少一个或多个区域具有缓冲层,该缓冲层对于在> 265℃至450℃的范围内熔化的金属共晶溶液具有<35°的润湿角。本发明还涉及一种部件覆盖件,其具有以可比较的方式具有所述缓冲层的区域之一。本发明还涉及一种晶片部件或一种部件,其可以使用微系统技术插入并且具有借助于焊料材料施加的覆盖晶片或部件盖,并且涉及其制造方法。

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