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METHOD FOR GENERATING ASSIST FEATURES WITH CONSIDERING EFFECT OF NEIGHBOR PATTERN

机译:考虑邻域效应的辅助特征生成方法

摘要

A method for generating assist features taking into account the effect of a neighbor pattern is provided to improve a process margin due to the introduction of the assist features by enlarging a line width of the assist feature. A layout on which major features(210,220) having different line widths are arranged is designed. Separated intervals(440,450) of the major features are detected to set an initial line width of an assist feature(310). A rule for reducing the initial line width of the assist feature is set according to the increase of a line width size adjacent to the assist feature or the decrease of the separated interval between the major features. The line width size of the major feature adjacent to the assist feature and the separated interval between the major features are detected. A reduction width for the initial line width of the assist feature corresponding to the line width size and the separated interval of the detected major feature is extracted from the rule. A real assist feature is created on the layout by applying the reduction width to the initial line width size of the assist feature.
机译:提供了一种用于产生考虑到相邻图案的影响的辅助特征的方法,以通过扩大辅助特征的线宽来改善由于引入辅助特征而引起的工艺裕度。设计在其上布置具有不同线宽的主要特征(210,220)的布局。检测主要特征的分离间隔(440,450)以设置辅助特征(310)的初始线宽。根据邻近辅助特征的线宽尺寸的增加或主要特征之间的分隔间隔的减小来设置减小辅助特征的初始线宽的规则。检测与辅助特征相邻的主要特征的线宽大小以及主要特征之间的分隔间隔。从规则中提取辅助特征的初始线宽的减小宽度,该减小宽度对应于线宽尺寸和检测到的主要特征的分离间隔。通过将缩小宽度应用于辅助功能的初始线宽大小,可以在布局上创建真正的辅助功能。

著录项

  • 公开/公告号KR20080092548A

    专利类型

  • 公开/公告日2008-10-16

    原文格式PDF

  • 申请/专利权人 HYNIX SEMICONDUCTOR INC.;

    申请/专利号KR20070035993

  • 发明设计人 HONG JONG KYUN;

    申请日2007-04-12

  • 分类号H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 19:52:52

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