首页> 外国专利> Exahaust gas processing device for Energy Efficient using of Microwave electric heating element and Plasma ultraviolet rays lamp

Exahaust gas processing device for Energy Efficient using of Microwave electric heating element and Plasma ultraviolet rays lamp

机译:高效利用微波电加热元件和等离子紫外线灯的废气处理装置

摘要

exhaust gas treatment apparatus of the present invention contain contaminants, ; process the contaminants contained in the exhaust gas (A) provided by a stirrer (3) in the center of the inside of the oxygen or ozone (B) to the reaction chamber (1) for the oxidation reaction; ; UV lamp for a plasma to remove contaminants from the reaction chamber 1, a plasma layer is formed by the ozone-treated exhaust gas introduced from the ultraviolet to the plasma (4); And ; passes through the heating element layer (7) was heat to a high temperature by the injection of the plasma UV lamp (4) microwave scanning apparatus introduced from the exhaust gas (6), while the combustor for burning at a high temperature ( 5);. ; to relate to energy-efficient exhaust gas treatment apparatus using a plasma and a microwave UV lamp, characterized in that the heating element made of injection ; The present invention has the configuration of the by the combustion exhaust gas at a high temperature of 1,400 ~ 1,500 layer was passed through a heating element with high temperature heating by microwave injection prior to release to the atmosphere an exhaust gas containing contaminants and finally, contaminants that are contained in the exhaust gas be able to remove most of the material as well as a small amount of energy, while momentarily by scanning using microwave energy efficiency can be increased as much as possible because the use of a heating element which can heat up to a high temperature, and the exhaust gas treatment device according to the invention in the use of ozone caused by the first exhaust gas flowing to the oxygen or oxidizing corona discharge odors and pollutants contained in the exhaust gas treatment, and the exhaust gas from the discharge plasma layer formed by the plasma discharge UV lamp by nitrogen oxides, sulfur oxides, such as removal of the contaminants and then passed through a heating element layer having a high temperature by microwave heating at high temperature combustion injection of 1,400 ~ 1,500 , can improve the removal efficiency of the pollutants contained in the exhaust gas that it is advantages.
机译:本发明的废气处理装置中含有污染物。在氧气或臭氧(B)内部的中央将由搅拌器(3)提供的废气(A)中包含的污染物处理到反应室(1)以进行氧化反应; ;用于从反应室1中去除污染物的等离子紫外灯,由从紫外线引入等离子的臭氧处理废气形成等离子层(4);和;穿过加热元件层(7)的气体通过注入从废气(6)引入的等离子UV灯(4)微波扫描仪而被加热到高温,而燃烧器则在高温下燃烧(5) ;。 ;本发明涉及一种利用等离子体和微波紫外线灯的节能型废气处理装置,其特征在于,所述加热元件由注入制成;本发明具有如下构造:通过将燃烧的废气在1400〜1500层的高温下通过加热元件通过微波注入进行高温加热,然后释放到大气中,所述废气包含污染物,最后是污染物。包含在废气中的金属能够去除大部分材料以及少量的能量,同时通过使用微波进行扫描可以暂时提高能量效率,因为使用了可以加热的加热元件根据本发明的废气处理装置,其利用由第一废气流向氧气或氧化电晕所引起的臭氧排放废气处理中所包含的气味和污染物,以及来自废气的废气。等离子放电紫外线灯通过氮氧化物,硫氧化物等去除污染物而形成的放电等离子体层然后通过微波加热在高温下注入1400〜1500℃的高温加热而通过高温的加热元件层,具有提高废气中所含污染物的去除效率的优点。

著录项

  • 公开/公告号KR100794238B1

    专利类型

  • 公开/公告日2008-01-15

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20050099544

  • 发明设计人 장대식;

    申请日2005-10-21

  • 分类号B01D53/00;B01D53/14;B01D53/74;

  • 国家 KR

  • 入库时间 2022-08-21 19:52:41

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