METHOD FOR MATCHING SIGMA THROUGH MODEL BASED OPC

摘要

A method for matching a sigma through a model-based OPC(optical proximity correction) is provided to minimize a matching error between heterogeneous equipments by making an OPC model while using OPC data of reference equipment and heterogeneous equipment and by performing a sigma matching process through a model-based OPC. A sigma is set according to a characteristic between reference equipment and heterogeneous equipment(S100). OPC data of each equipment is gathered to set up an OPC model with respect to the reference equipment and the heterogeneous equipment(S102). The data gathered from each equipment is listed to make an OPC data sheet(S104). An OPC model is set up by using the OPC data sheet(S106). A sigma matching process between the reference equipment and the heterogeneous equipment is performed by using the set-up OPC model(S108). The process for making the OPC data sheet can include the following steps. An average value is calculated with respect to a pitch characteristic and an Iso line data of the reference equipment and the heterogeneous equipment. Data of equipment in which a small space is defined is selected while Iso space data of each equipment is not averaged. An average value is calculated with respect to 2D pattern data of each equipment to make the OPC data sheet.