Process control monitoring pattern for highly effective physical analysis

摘要

presents a process control monitor (PCM) patterns for the physical analysis of high efficiency. According to the present invention , in order to recognize the state chip (chip) between the scribe line region (scribe line) Identification and address of the main pattern , and a unit pattern comprising a plurality of unit patterns formed on the area (address) of the semiconductor element can be repeated at regular intervals , including marking pattern around a pattern (marking pattern) to provide a process control monitoring system including an auxiliary pattern pattern is introduced .