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NEGATIVE PHOTOSENSITIVE THERMOSETTING RESIN COMPOSITION, TRANSFER MATERIAL FOR NEGATIVE PHOTOSENSITIVE THERMOSETTING RESIN LAYER, AND METHOD OF FORMING IMAGE HAVING NEGATIVE RESISTANCE
NEGATIVE PHOTOSENSITIVE THERMOSETTING RESIN COMPOSITION, TRANSFER MATERIAL FOR NEGATIVE PHOTOSENSITIVE THERMOSETTING RESIN LAYER, AND METHOD OF FORMING IMAGE HAVING NEGATIVE RESISTANCE
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机译:负性光敏热固性树脂组成,负性光敏热固性树脂层的转移材料以及形成具有负性电阻的图像的方法
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摘要
PURPOSE: To provide a negative type photosensitive thermosetting resin composition having excellent shelf stability, developable with a weakly basic aqueous solution, having high resolution, excellent transparency, heat and chemical resistances and insulating property and to provide a material for transferring negative type photosensitive thermosetting resin layer. CONSTITUTION: The negative type photosensitive thermosetting resin composition contains at least 10-90 mass% alkali-soluble resin obtained by copolymerizing a polymerizable monomer of formula (I) and a carboxylic acid-containing monomer, 5-50 mass% ethylenically unsaturated compound and 0.1-50 mass% photopolymerization initiator, based on the total solid content. The material for transferring negative type photosensitive thermosetting resin layer is obtained by disposing a layer comprising the negative type photosensitive thermosetting resin on a temporary base body. In the formula (I), R1 is H or methyl and X is halogen, hydroxy, alkoxy which may have a 1-12C substituent, aryloxy or the like.
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