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A method for controlling mechanical stresses in the structure of the film substrate

机译:控制膜基材结构中的机械应力的方法

摘要

method u043au043eu043du0442u0440u043eu043bu00a0 mechanical u043du0430u043fu0440u00a0u0436u0435u043du0438u0439 in the film - substrate, comprising the formation of an intermediate between the film and substrate u0441u043bu043eu00a0 the intended thickness of the sun u043au0440u044bu0442u0438u0435 sheeting method u0444u043eu0442u043eu043bu0438u0442u043eu0433u0440u0430u0444u0438u0438 windows, the strips of film at the edge of the window 5 to 100 microns in width by selective u0442u0440u0430u0432u043bu0435u043du0438u00a0 intermediate u0441u043bu043eu00a0,the definition of relative u0443u0434u043bu0438u043du0435u043du0438u00a0 film on u0438u043du0442u0435u0440u0444u0435u0440u0435u043du0446u0438u043eu043du043du043eu0439 painting in u0437u0430u0437u043eu0440u0435 film - substrate and the calculation formula of mechanical u043du0430u043fu0440u00a0u0436u0435u043du0438u0439;where l is the length of the free u043au0440u0430u00a0 oxide, u0438u0441u0445u043eu0434u043du0430u00a0 length l0 - u043eu043au0441u0438u0434u043du043eu0439 films before her u043eu0442u0434u0435u043bu0435u043du0438u00a0, ef, f - young's modulus and poisson's ratio of film, u043eu0442u043bu0438u0447u0430u044eu0449u0438u0439u0441u00a0, windows at the tape shaped in the form of a circle, and the elongation u043eu043fu0440u0435u0434u0435u043bu00a0u044eu0442 in u0440u0430u0434u0438u0430u043bu044cu043du043eu043c direction.
机译:薄膜-基板中的方法 u043a u043e u043d u0442 u0440 u043e u043b u00a0机械 u043d u0430 u043f u0440 u00a0 u0436 u0435 u043d u0438 u0439在薄膜和基材之间 u0441 u043b u043e u00a0太阳的预期厚度 u043a u0440 u044b u0442 u0438 u0435切片方法 u0444 u043e u0442 u043e u043b u0438 u0442 u043e u0433 u0440 u0430 u0444 u0438 u0438窗口,通过选择性地选择 u0442 u0440 u0430 u0432 u043b u0435 u043d u0438 u00a0中间的窗口边缘处的薄膜条宽度为5到100微米 u0441 u043b u043e u00a0,相对 u0443 u0434 u043b u0438 u043d u0435 u043d u0438 u00a0胶片上的定义 u0438 u043d u0442 u0432 u0435 u0440 u0444 u0435 u0440 u0437 u0430 u0437 u043e u0440 u0435薄膜-基材上的u0435 u043d u0446 u0438 u043e u043d u043d u043e u0439绘画和机械 u043d u0430 u043f u0440 u0040 u0436 u0435 u043d u0438 u0439;其中l是th的长度e免费 u043a u0440 u0430 u00a0氧化物, u0438 u0441 u0445 u043e u0434 u043d u0430 u00a0长度l0- u043e u043a u0441 u0438 u0434 u043d u043e u0439影片 u043e u0442 u0434 u0435 u043b u0435 u043d u0438 u00a0,ef,f-薄膜的杨氏模量和泊松比, u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0438 u0439 u0441 u00a0,带子处的窗口呈圆形,并且 u0440 u0430 u0434 u0432中的伸长率 u043e u043f u0440 u0435 u0434 u0435 u043b u043b u00a0 u044e u0442 u0430 u043b u044c u043d u043e u043c方向。

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