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Heavy-duty MONOCRYSTALS CVC-diamond, and three-dimensional growth

机译:重型MONOCRYSTALS CVC金刚石和三维生长

摘要

1. A single crystal diamond grown using microwave plasma-induced chemical vapor deposition that has a toughness of at least about 30 MPa m.2. A single crystal diamond according to claim 1, the strength of which is at least about 35 MPa m.3. A single crystal diamond according to claim 2, the strength of which is at least about 40 MPa M.4. A single crystal diamond according to claim 1, the hardness of which varies from about 100 to about 160 GPa.5. A method of growing superalloy single crystal diamond comprising sebyai) placing the crystal nucleus of diamond heat sink holder made of a material having a high melting point and high thermal conductivity to minimize temperature gradients in the direction from edge to edge surface of the diamond growth; ii) temperature control surface of the diamond growth so that the temperature of the growing diamond crystals is in the range of about 1050-1200 ° C; and iii) growing single crystal diamond by means of the induced microwave plasma chemical vapor deposition on the surface growth of diamond in a deposition chamber in which the atmosphere is characterized by a nitrogen relation to methane of about 4% N / CH, iv) carrying out annealing of single crystal diamond such that the annealed single crystal of diamond has a strength of at least about 30 MPa m.6. A method according to claim 5, wherein iv) comprises step of annealing the single crystal diamond at pressures in excess of from about 5 to about 7 GPa and temperatures of from about 2000 ° C to about 2700 ° C so that the hardness is from about 100 to about 160 GPa. 7. A method according to claim 5, wherein single crystal diamond prior to annealing is substantially
机译:1.使用微波等离子体诱导化学气相沉积法生长的单晶金刚石,其韧性至少约为30 MPa m.2。 2.根据权利要求1的单晶金刚石,其强度至少约为35MPa m.3。 3.根据权利要求2所述的单晶金刚石,其强度为至少约40MPa M.4。 2.根据权利要求1的单晶金刚石,其硬度为约100-约160GPa.5。一种生长超合金单晶金刚石的方法,包括:(sebaiai)将金刚石散热片支架的晶核放在由高熔点和高导热率的材料制成的表面上,以使从金刚石生长的边缘到边缘表面的方向上的温度梯度最小。 ii)金刚石生长的温度控制表面,以使生长的金刚石晶体的温度在约1050-1200°C的范围内; iii)在沉积室中金刚石的表面生长过程中,通过诱导微波等离子体化学气相沉积法在金刚石的表面生长上生长单晶金刚石,在该沉积室中,大气的特征是甲烷与甲烷的氮含量约为4%N / CH,iv)携带对单晶金刚石进行退火处理,使退火后的单晶金刚石具有至少约30 MPa m.6的强度。 6.根据权利要求5所述的方法,其中iv)包括以下步骤:在超过约5至约7GPa的压力和约2000℃至约2700℃的温度下对所述单晶金刚石进行退火,以使所述硬度为约2。 100至约160 GPa。 7.根据权利要求5的方法,其中在退火之前的单晶金刚石基本上是

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