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Method and apparatus for plasma coating of workpieces with spectral evaluation of the process parameters and use of the device

机译:用工艺参数的光谱评估对工件进行等离子喷涂的方法和设备以及该设备的使用

摘要

A method for the coating of containers induced by means of plasma chemical vapor deposition, in which a nitrogen-containing process gas introduced into a coating chamber and by means of electromagnetic energy, a plasma in at least one of the container adjacent region of the coating chamber is ignited, in which the process gas is present, characterized in that the coating process by means of at least of a measured spectral parameter of the plasma can be determined and the container in the event of a deviation from a target range of the parameter of the container is sorted out, wherein with the aid of the measurement of the spectral parameter of the intensity of a transmit - or absorption line of nitrogen, it is established whether the container has a leak.
机译:一种通过等离子体化学汽相沉积法对容器进行涂覆的方法,其中,将含氮的工艺气体引入涂覆室中,并通过电磁能在涂覆层的至少一个容器相邻区域中引入等离子体。点燃腔室,在腔室中存在工艺气体,其特征在于,借助于至少测量的等离子体光谱参数可以确定涂覆过程,并且在偏离参数的目标范围的情况下确定容器挑选出容器的底部,其中借助于测量氮气的透射线或吸收线的强度的光谱参数,确定容器是否有泄漏。

著录项

  • 公开/公告号DE102004042431B4

    专利类型

  • 公开/公告日2008-07-03

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE20041042431

  • 发明设计人

    申请日2004-08-31

  • 分类号C23C16/52;C23C16/54;C23C16/515;

  • 国家 DE

  • 入库时间 2022-08-21 19:50:06

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