首页> 外国专利> Method for compensating for production reasons, the incident deviations in the production of micromechanical elements and their use

Method for compensating for production reasons, the incident deviations in the production of micromechanical elements and their use

机译:用于补偿生产原因,微机械元件的生产中的入射偏差及其用途的补偿方法

摘要

The present invention relates to micromechanical elements, a process for their preparation and their use, which in the case of a resonant frequency are to be deflected. It is therefore an object of the invention as a consequence of the occurring deviations, the influence on the resonant frequency of micromechanical elements have, in a simple and cost-effective manner to be able to compensate for. According to the invention, the procedure is such that simultaneously with the formation of the channels by dry etching, with which at least one spring element, a deflecting element and, if necessary, also a frame element of micromechanical elements are formed, at the deflectable element additional trenches and / or depressions are designed. As a result, the trenches and depressions each case under the same process parameters on the respective micromechanical element or all of the micromechanical elements are formed of a charge. A material removal of material during the etching, preferably dry etching, therefore, takes place under the same etching conditions, so that each of the remote mass of the trenches and / or depressions of the etching process parameters is influenced in the same manner.
机译:本发明涉及微机械元件,其制备方法及其用途,在共振频率的情况下,它们将被偏转。因此,本发明的目的是,由于出现的偏差,能够以简单且成本有效的方式补偿对微机械元件的共振频率的影响。根据本发明,该程序使得在通过干蚀刻形成通道的同时,在可偏转的位置处形成至少一个弹簧元件,偏转元件以及必要时还形成微机械元件的框架元件。元素设计了额外的沟槽和/或凹陷。结果,在相应的微机械元件上或在所有的微机械元件上以相同的工艺参数分别形成的沟槽和凹陷由电荷形成。因此,在相同的蚀刻条件下进行蚀刻期间材料的材料去除,优选地是干法蚀刻,从而以相同的方式影响沟槽的远端质量和/或蚀刻工艺参数的降低。

著录项

  • 公开/公告号DE102006043388B3

    专利类型

  • 公开/公告日2008-04-10

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE20061043388

  • 发明设计人

    申请日2006-09-08

  • 分类号B81B3/00;B81C1/00;

  • 国家 DE

  • 入库时间 2022-08-21 19:49:46

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号