Micro-lithographic projection illumination system for manufacturing e.g. highly integrated electrical circuit, has correction device including correction unit that is attached and demounted in objective without dismantling objective

摘要

The system (10) has an immersion objective (20) provided for immersion operation, where a screen (24) is mapped on a light-sensitive layer (26) and an immersion fluid is present between the immersion objective and the light-sensitive layer. A correction device (34) reduces imaging errors, which are induced by directly applying a faceplate (36) on the light-sensitive layer such that the immersion fluid does not contact the light-sensitive layer. The correction device includes a correction unit that is attached and demounted in the objective without dismantling the objective. An independent claim is also included for a method for micro-lithographic manufacturing of a micro-structured component.