Method and system for reducing the exposure fields by means of mounting errors in by means of apc - control strategies comprises circuitry arranged

摘要

By taking into consideration plant-specific signal distortion signatures and reticle specific positioning properties in a adjustment, the control system, the control quality of modern apc - strategies are significantly improved. Corresponding correction data, on the basis of combinations of installation / reticles and layers, which are to be adjusted with respect to one another, to be determined, which is then the corresponding desired values of adjustment can modify parameters for controlling the adjustment processes on the basis of standard by means of mounting mes data are used, which are obtained from corresponding overlay marks.