A METHOD AND A SYSTEM FOR REDUCING OVERLAY ERRORS WITHIN EXPOSURE FIELDS BY APC CONTROL STRATEGIES

摘要

By considering the specific tool of the reticle warpage signature and unique characteristics of the batch in the alignment control system, the quality control of the APC sophisticated method can be significantly improved. May be each of the correction data is set based on the combination of the layers and the tool / reticle are aligned to each other, which each of the alignment parameters used to control a sorting process based on a standard overlay measurement data obtained from a dedicated overlay marks You can modify the target value.