首页> 外国专利> Re-imageable printing plate treating method, involves modifying surface working as printing surface, of plate in nanoscopic range while changing chemical end groups of surface, and applying absorbing layer on surface

Re-imageable printing plate treating method, involves modifying surface working as printing surface, of plate in nanoscopic range while changing chemical end groups of surface, and applying absorbing layer on surface

机译:可再成像的印版处理方法,涉及在纳米范围内改变版材的表面作为印刷表面,同时改变表面的化学端基,并在表面上施加吸收层

摘要

The method involves modifying a semiconductor surface (106) working as a printing surface (104), of a printing plate (102) in a nanoscopic range while changing chemical end groups of the semiconductor surface. The printing plate is treated with an infrared laser radiation (124). A near infrared absorbing layer (112) is applied on the semiconductor surface. A mask (132) corresponding to information to be printed, is produced by the treatment of the printing plate with the infrared-laser radiation. An independent claim is also included for a method for printing information.
机译:该方法包括在纳米范围内修饰用作印刷板(102)的印刷表面(104)的半导体表面(106),同时改变半导体表面的化学端基。用红外激光辐射(124)处理印刷版。在半导体表面上施加近红外吸收层(112)。通过用红外激光辐射处理印版来产生与要印刷的信息相对应的掩模(132)。还包括用于打印信息的方法的独立权利要求。

著录项

  • 公开/公告号DE102007043846A1

    专利类型

  • 公开/公告日2008-04-10

    原文格式PDF

  • 申请/专利权人 HEIDELBERGER DRUCKMASCHINEN AG;

    申请/专利号DE20071043846

  • 发明设计人 LINGENFELSER DOMINIC;HESS PETER;

    申请日2007-09-14

  • 分类号B41C1/10;G03F7/09;G03F7/00;

  • 国家 DE

  • 入库时间 2022-08-21 19:49:11

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