Light polarization state measuring device for microlithography projection exposure system, has quarter wavelength plate and half wavelength plate, which are firmly connected with each other and are rotatable around common axis of rotation

摘要

The device has an quarter wavelength plate (38) and a half wavelength plate (40), which are firmly connected with each other and are rotatable around an individual common axis of rotation (36), where the plates form two disk segments, respectively. A beam splitter cube (28) has a polarization-selective beam-splitting layer (30), which is transmissive for a linear polarization state, and is reflective for another polarization state, which is orthogonal to the former polarization state.