首页> 外国专利> Barrier layer creating process for microstructured component involves preparing component in plasma reactor, plasma treatment, and supplying precursor and carrier gas

Barrier layer creating process for microstructured component involves preparing component in plasma reactor, plasma treatment, and supplying precursor and carrier gas

机译:用于微结构组件的阻挡层创建过程涉及在等离子体反应器中准备组件,等离子体处理以及供应前驱物和载气

摘要

The barrier layer creating process consists of preparing the component in a plasma reactor with steam doser and gas supply; plasma treating the component in the region to be coated with a plasma from inert carrier gas to activate it, then supplying a steam or gas precursor to the carrier gas by steam dosing, gas exchanging back to inert carrier gas, and repeating the process several times.
机译:阻挡层的形成过程包括在具有蒸汽定量器和气体供应的等离子反应器中制备组件;等离子处理待处理区域中的成分,该成分将被惰性载气中的等离子体激活,然后通过蒸汽定量给载气供应蒸汽或气体前体,将气体交换回惰性载气,并重复该过程数次。

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