首页> 外国专利> Method for manufacturing semiconductor devices with which chips are structured, tested and isolated on wafer, involves processing fractured wafer and damaged chip with edge portion and breakage outline with limited fragment

Method for manufacturing semiconductor devices with which chips are structured, tested and isolated on wafer, involves processing fractured wafer and damaged chip with edge portion and breakage outline with limited fragment

机译:用于在晶片上构造,测试和隔离芯片的半导体器件的制造方法,包括处理破裂的晶片和具有边缘部分和破损轮廓且碎片有限的损坏的芯片

摘要

The method involves processing fractured wafer (1) and a damaged chip (2) with an edge portion (11) and a breakage outline (12) with limited fragment (15). The fragment is positioned during processing in such a way that it has the same adjustment as it was still a component of the wafer. An independent claim is also included for a device for processing an edge portion and a fracturing outline for a limited fragment of a wafer.
机译:该方法包括处理破裂的晶片(1)和具有边缘部分(11)和具有有限碎片(15)的断裂轮廓(12)的受损芯片(2)。在处理过程中,以与晶片仍然相同的方式进行调整的方式定位碎片。还包括用于处理晶片的有限片段的边缘部分和断裂轮廓的装置的独立权利要求。

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