首页>
外国专利>
ELECTRONIC/MICROWLING ASYLUM PECVD PROCEDURES AND PREPARATION FOR STORAGE AND/OR SURFACE MODIFICATION OF DUNNFILM MATERIALS
ELECTRONIC/MICROWLING ASYLUM PECVD PROCEDURES AND PREPARATION FOR STORAGE AND/OR SURFACE MODIFICATION OF DUNNFILM MATERIALS
展开▼
机译:电子/复合避震PECVD程序和用于DUNNFILM材料的存储和/或表面改性的制备
展开▼
页面导航
摘要
著录项
相似文献
摘要
A novel high speed, high quality plasma enhanced surface modification or CVD thin-film deposition method and apparatus. The invention employs both microwave (5) and e-beam energy (6) for creation of a plasma of excited species which modify the surface of substrates (2) or are deposited onto substrates to form the desired thin film. The invention also employs a gas j et system (3) to introduce the reacting species to the plasma. This gas jet system (3) allows for higher deposition speed than conventional PECVD processes while maintaining the desired high quality of the deposited materials.
展开▼