Remove disturbing device influences from a bending structure by unfolding using a bending angle dependent device function

摘要

A method of correcting for aberrations in scattering data is described which does not require prior knowledge about the sample microstructure properties or calculations based on the modelling of peak locations. In an example, X-ray scattering apparatus integrates a correction device arranged to automatically calculate and output aberration corrected output X-ray pattern using the aberration Fourier presentation F inst (H,2¸) dependent from the scattering angle 2¸ and the Fourier transform of the measured X-ray scattering pattern F exp (H).