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DEVICE AND METHOD FOR MEASURING CAPACITY VARIATION OF MICROSTRUCTURE

机译:测量微结构能力变化的装置和方法

摘要

PROBLEM TO BE SOLVED: To provide a capacity variation measuring device and a capacity variation measuring method of a microstructure for measuring microvolume with a simple measuring circuit.;SOLUTION: The microstructure 1 comprises a fixed section electrode 4 and a movable section electrode 5 that is arranged facing to the fixed section electrode 4 and has a capacitance between it and the fixed section electrode 4. A bias generation circuit 20 applies a bias potential between the fixed section electrode 4 and the movable section electrode 5. A current measurement circuit 30 detects the current flowing between the fixed section electrode 4 and the movable section electrode 5 when the bias potential is applied. A current variation detection discrimination circuit 40, based on the detected variation in current with time, measures the variation in capacitance between the fixed section electrode 4 and the movable section electrode 5.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种利用简单的测量电路来测量微体积的微结构的容量变化测量装置和容量变化测量方法。解决方案:微结构1包括固定截面电极4和可动截面电极5,可移动截面电极5是固定的。固定部分电极4面对固定部分电极4布置并且在其与固定部分电极4之间具有电容。偏置产生电路20在固定部分电极4和可移动部分电极5之间施加偏置电势。电流测量电路30检测该电势。当施加偏置电位时,电流在固定部电极4和可动部电极5之间流动。电流变化检测判别电路40基于检测到的电流的时间变化来测量固定部电极4与可动部电极5之间的静电电容的变化。(COPYRIGHT:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2009139173A

    专利类型

  • 公开/公告日2009-06-25

    原文格式PDF

  • 申请/专利权人 TOKYO ELECTRON LTD;

    申请/专利号JP20070314453

  • 发明设计人 FUJIWARA TAKASHI;IKEUCHI NAOKI;

    申请日2007-12-05

  • 分类号G01P21/00;H01L29/84;G01P15/125;

  • 国家 JP

  • 入库时间 2022-08-21 19:44:30

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