FILM-THICKNESS MEASUREMENT METHOD, FILM-THICKNESS MEASUREMENT DEVICE, IMAGE FORMATION APPARATUS HAVING THE SAME, PHOTORECEPTOR, AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a film-thickness measurement method simultaneously, surely and accurately measuring the film thickness an optically-transparent film of a measurement object formed with the optically-transparent film through a undercoat layer on a support substrate, and the total film thickness of the undercoat layer and the optically-transparent film; a film-thickness measurement device; and an image formation apparatus.;SOLUTION: Light from a light source emitting spectral light in a wavelength region allowing film-thickness measurement is emitted by a fiber probe, focused on an optically-transparent film, and vertically entered into a measurement object; interfering light between first reflected light obtained by reflecting the entered light on a surface of the optically-transparent film, and second reflected light reflected on a surface of a undercoat layer, and interfering light between the first reflected light and third reflected light reflected on a surface of a support substrate are guided to a spectral diffraction means to be spectrally diffracted; interference waveform is obtained by expanding the reflectance to an optional value when reflectance is calculated from the intensity of spectrally-diffracted spectrum; and the film thickness of the optically-transparent film and the total of the thickness of the undercoat layer and the thickness of the optically-transparent film are calculated based on a frequency analysis method decomposing the interference waveform into cosine wave components.;COPYRIGHT: (C)2009,JPO&INPIT