PLASMA SOURCE EQUIPPED WITH FERRITE STRUCTURE, AND PLASMA GENERATING DEVICE EMPLOYING THE SAME

摘要

PPROBLEM TO BE SOLVED: To provide a plasma source equipped with a ferrite structure in which the ferrite structure is installed in arch shape on a linear antenna of a built-in type inductively coupled plasma generating device and a field formed radially from the linear antenna can be concentrated on a treating substrate, and to provide a plasma generating device employing the same. PSOLUTION: The plasma source comprises a ferrite structure which concentrates a field formed radially from a roof type linear antenna in which one sides of a first antenna and a second antenna formed at the inner upper part in a reaction chamber are connected on a treating substrate direction which is arranged in the reaction chamber. By concentrating the fields formed in radial shape on the treating substrate, power loss is reduced, and density and uniformity of plasma in the reaction chamber are improved to enhance efficiency and yield of the semiconductor manufacturing process. PCOPYRIGHT: (C)2009,JPO&INPIT