首页> 外国专利> METHOD FOR IMAGING AND DISPLAYING BULK MICRO DEFECT IN SEMICONDUCTOR SINGLE CRYSTAL, PROGRAM AND PROGRAM-RECORDED AND COMPUTER-READABLE RECORDING MEDIUM

METHOD FOR IMAGING AND DISPLAYING BULK MICRO DEFECT IN SEMICONDUCTOR SINGLE CRYSTAL, PROGRAM AND PROGRAM-RECORDED AND COMPUTER-READABLE RECORDING MEDIUM

机译:成像和显示半导体单晶,程序,程序记录和计算机可读记录介质中的大块微缺陷的方法

摘要

PROBLEM TO BE SOLVED: To provide a method for enabling visual, intuitive recognition of the behavior of bulk micro defect (BMD) by displaying the behavior of BMD by computer simulation as the image represented by the infra-red tomographic method.;SOLUTION: The method of imaging to display BMD in the semiconductor single crystal using the computer comprises an input process of inputting into the computer, the information about the density of BMD in the semiconductor single crystal prepared by computer simulation in advance a calculation process of calculating the number of pieces of BMD in a display area by multiplying the above density by the volume corresponding to the display area of a display device a coordinate generation process of generating the position coordinates of BMD in the display area corresponding to the number of pieces using random numbers and an output process of displaying into a display device, BMD in the display area as an image according to the position coordinates.;COPYRIGHT: (C)2009,JPO&INPIT
机译:要解决的问题:提供一种方法,通过计算机模拟以红外层析成像方法表示的图像的形式显示BMD的行为,从而能够直观,直观地识别大块微缺陷(BMD)的行为。使用计算机进行成像以显示半导体单晶中的BMD的方法包括将计算机预先准备的关于半导体单晶中BMD密度的信息通过计算机模拟预先输入到计算机中的输入处理,计算数量的计算过程。通过将上述密度乘以与显示设备的显示区域相对应的体积,可以在显示区域中显示多条BMD,坐标生成过程是使用随机数和显示到显示设备中的输出过程,根据位置坐标将显示区域中的BMD作为图像显示s.COPYRIGHT:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2009067657A

    专利类型

  • 公开/公告日2009-04-02

    原文格式PDF

  • 申请/专利权人 COVALENT MATERIALS CORP;

    申请/专利号JP20070240468

  • 发明设计人 BANBA HIRONORI;

    申请日2007-09-18

  • 分类号C30B29/06;H01L21/00;

  • 国家 JP

  • 入库时间 2022-08-21 19:43:40

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