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POLISHING DEVICE AND POLISHING METHOD FOR SUBSTRATE FOR MAGNETIC RECORDING MEDIUM, GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM
POLISHING DEVICE AND POLISHING METHOD FOR SUBSTRATE FOR MAGNETIC RECORDING MEDIUM, GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM
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机译:磁记录介质基质的抛光装置和抛光方法,磁记录介质玻璃基质和磁记录介质的抛光方法
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摘要
PROBLEM TO BE SOLVED: To properly feed a polishing fluid to the portions of a plurality of substrates for magnetic recording medium each having a round hole at the center to be polished when the substrates are stacked and the inner peripheral end surfaces of the substrates are polished.;SOLUTION: The plurality of substrates 12 for magnetic recording medium each having a round hole at the center are stacked and held. A common polishing brush 18 is inserted into a center hole CH at least partly formed by the stacked substrates 12 to collectively polish the inner peripheral end surfaces 12i of the substrates 12 each having a round hole. When the polishing brush 18 is moved relative to the substrate 12 while being into contact with the inner peripheral end surfaces 12i of the substrates 12, the polishing fluid is fed to the center hole CH by a polishing fluid feeding means 20 so that the polishing fluid flows from the vertical lower side to the vertical upper side of the center hole.;COPYRIGHT: (C)2010,JPO&INPIT
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