METHOD OF PATTERNING SELF-ASSEMBLY NANO-STRUCTURE AND METHOD OF FORMING POROUS DIELECTRIC LAYER (METHOD OF PATTERNING SELF-ASSEMBLY NANO-STRUCTURE, AND THEN FORMING POROUS DIELECTRIC)

摘要

PROBLEM TO BE SOLVED: To provide a method of patterning a self-assembly nano-structure, and then forming a porous dielectric layer.;SOLUTION: In one aspect, the method of patterning a self-assembly nano-structure and forming a porous dielectric includes a step of providing a hardmask layer over an underlying layer; a step of predefining an area with a photoresist layer on the hardmask layer that is to be protected during the patterning; a step of forming a copolymer layer over the hardmask layer and the photoresist layer; a step of forming the self-assembly nano-structure from the copolymer layer; and a step of etching to pattern the self-assembly nano-structure.;COPYRIGHT: (C)2009,JPO&INPIT