首页> 外国专利> SCATTERING PARTICLE REMOVING DEVICE, SCATTERING PARTICLE REDUCING METHOD, LIGHT SOURCE APPARATUS, LIGHTING OPTICAL DEVICE, EXPOSURE DEVICE AND MANUFACTURING METHOD OF ELECTRONIC DEVICE

SCATTERING PARTICLE REMOVING DEVICE, SCATTERING PARTICLE REDUCING METHOD, LIGHT SOURCE APPARATUS, LIGHTING OPTICAL DEVICE, EXPOSURE DEVICE AND MANUFACTURING METHOD OF ELECTRONIC DEVICE

机译:散射粒子去除设备,散射粒子减少方法,光源装置,照明光学设备,曝光设备和电子设备的制造方法

摘要

PROBLEM TO BE SOLVED: To prevent the deterioration of the optical performance of an optical system by efficiently removing scattering particles.;SOLUTION: This scattering particle removing device removing scattering particles generated by plasma generation is provided with an electrode plate arranged in an optical path of EUV light radiated from plasma and a voltage applying part which is installed outside the optical path of EUV light and applies a positive voltage or a negative voltage to the electrode plate. The electrode plate is disposed to cross the optical path of EUV light.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:为了通过有效地去除散射颗粒来防止光学系统的光学性能变差;解决方案:该散射颗粒去除装置去除了由等离子体产生的散射颗粒,并在其光路中设置有电极板。从等离子体辐射的EUV光和电压施加部分安装在EUV光的光路之外,并向电极板施加正电压或负电压。电极板设置为与EUV光的光路交叉。;版权所有:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2009070982A

    专利类型

  • 公开/公告日2009-04-02

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP20070236897

  • 发明设计人 AOKI TAKASHI;

    申请日2007-09-12

  • 分类号H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 19:43:00

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