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ICP EMISSION SPECTRAL ANALYSIS METHOD

机译:ICP发射光谱分析方法

摘要

PROBLEM TO BE SOLVED: To provide an ICP emission spectral analysis method for easily, efficiently and accurately implementing a quantitative analysis of an element to be measured, even if a sample solution to be measured contains elements other than the element to be measured.;SOLUTION: In the ICP emission spectral analysis method, components within the sample solution are excited by introducing the sample solution into a high frequency plasma, after the sample solution is nebulized, each element emits a light with a characteristic wavelength, and quantitative analysis of the elements inside the sample solution is implemented, based on emission spectra obtained by separating the light. The same element other than the element to be measured is added to both a standard sample solution having the element to be measured with a known concentration and the sample solution to be measured so that they are at the same concentration. Quantitative analysis of the to-be-measured element to be measured is implemented, based on emission intensities of the element to be measured in both solutions.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种ICP发射光谱分析方法,即使待测样品溶液中含有待测元素以外的其他元素,也可以轻松,高效,准确地对待测元素进行定量分析。 :在ICP发射光谱分析方法中,通过将样品溶液引入高频等离子体中来激发样品溶液中的成分,在将样品溶液雾化之后,每个元素都会发出具有特征波长的光,并对元素进行定量分析样品溶液内部的实现是基于分离光获得的发射光谱。将除了待测元素之外的相同元素添加到具有已知浓度的待测元素的标准样品溶液和待测样品溶液中,使它们处于相同浓度。基于两种溶液中被测元素的发射强度,对被测元素进行了定量分析。版权所有:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2009085943A

    专利类型

  • 公开/公告日2009-04-23

    原文格式PDF

  • 申请/专利权人 SUMITOMO ELECTRIC IND LTD;

    申请/专利号JP20080225069

  • 发明设计人 MORISHIGE YOSUKE;NAKAMURA MOTONORI;

    申请日2008-09-02

  • 分类号G01N21/73;

  • 国家 JP

  • 入库时间 2022-08-21 19:42:26

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