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METHOD FOR PRODUCING THREE-DIMENSIONAL PHOTONIC CRYSTAL AND THREE-DIMENSIONAL PHOTONIC CRYSTAL

机译:三维光子晶体和三维光子晶体的制备方法

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a three-dimensional photonic crystal to improve device characteristics, while easily producing a complicated three-dimensional structure, especially a three-dimensional periodic structure in a nano-photonic crystal with high precision at a low cost; and to provide the three dimensional photonic crystal.;SOLUTION: The method for producing the three-dimensional photonic crystal includes: a process for preparing a base material having a first face crossing a second face with a first angle; a process for forming a first mask on the first face; a process for forming pores in the base material by applying dry-etching to the first face from a second angle by using the first mask; a process for forming a second mask on the second face; and a process for forming pores in the base material by applying dry-etching to the second face from a third angle by using the second mask. The first and second masks are each formed in the surface layer of the mask forming face of the base material by implanting a focused ion beam.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种用于制造三维光子晶体以改善器件特性的方法,同时容易地在纳米光子晶体中以较高的精度容易地制造复杂的三维结构,尤其是三维周期性结构。低成本;解决方案:用于制造三维光子晶体的方法包括:用于制备具有第一面与第二面以第一角度相交的第一表面的基材的工艺;以及用于制造三维光子晶体的方法。在第一面上形成第一掩模的过程;通过使用第一掩模从第二角度对第一面进行干法蚀刻在基材上形成孔的工艺;在第二面上形成第二掩模的工艺;通过使用第二掩模从第三角度对第二面进行干法蚀刻而在基材中形成孔的方法。第一和第二掩模分别通过注入聚焦的离子束而形成在基材的掩模形成面的表面层中。; COPYRIGHT:(C)2009,JPO&INPIT

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