SILICON-MADE NOZZLE SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, DROPLET DISCHARGE HEAD, AND DROPLET DISCHARGE DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a nozzle substrate, including a nozzle hole, the nozzle hole having a desired slop to enhance the density of a nozzle, and being formed by a continuous curved surface to optimize the flow passage characteristic.;SOLUTION: The silicon-made nozzle substrate includes the nozzle hole 11 for discharging droplets. The nozzle hole 11 is formed of a continued curved surface of a rotator having a central axis 11d vertical to the substrate surface, in which a sectional area vertical to the central axis 11d is gradually increased from a discharge part 11a to an inlet part 11b, and a sectional shape including the central axis 11d has a linear symmetric index curve 11e with the central axis 11d as a symmetric axis.;COPYRIGHT: (C)2009,JPO&INPIT