首页> 外国专利> METHOD AND SYSTEM FOR LOCALLY ANNEALING MICROSTRUCTURE FORMED ON SUBSTRATE AND ELEMENT FORMED THEREBY

METHOD AND SYSTEM FOR LOCALLY ANNEALING MICROSTRUCTURE FORMED ON SUBSTRATE AND ELEMENT FORMED THEREBY

机译:在基体上局部退火的微观结构和由此形成的元素的方法和系统

摘要

PROBLEM TO BE SOLVED: To achieve trimming at a high throughput by a microstructure.;SOLUTION: Batch-compatible post-fabrication annealing method and system are described in such a manner that they are used to trim a resonance frequency of a mechanical microstructure, particularly a micromechanical structure such as a micromechanical resonator and to enhance a Q factor. The technique involves running a current through the micromechanical structure or through an adjacent microstructure (for example, adjacent resistor) to consume power, heating the structure to a temperature high enough to change the microstructure and/or its material characteristic thereby, and leading to changes in the resonance frequency of the microstructure and in the Q factor. The technique allows the trimming of many microstructures to be carried out simultaneously and conveniently all at once and it is implemented by simply applying a voltage across an anchor 10 part of the micromechanical structure.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:为了通过微结构实现高通量的修整;解决方案:批量兼容的后加工退火方法和系统的描述方式是,它们用于修整机械微结构的共振频率,特别是微机械结构,例如微机械谐振器,并提高Q因子。该技术涉及使电流流过微机械结构或流经相邻的微结构(例如,相邻的电阻器)以消耗功率,将结构加热到足够高的温度,从而改变微结构和/或其材料特性,并导致变化在微观结构的共振频率和Q因子。该技术允许同时对多个微结构进行修整并方便地一次完成,并且只需在微机械结构的10个锚点上施加电压即可实现该技术。版权所有:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2009044741A

    专利类型

  • 公开/公告日2009-02-26

    原文格式PDF

  • 申请/专利权人 REGENTS OF THE UNIV OF MICHIGAN;

    申请/专利号JP20080209628

  • 发明设计人 NGUYEN CLARK T-C;WANG KUN;

    申请日2008-08-18

  • 分类号H03H9/24;H01L29/84;B81C5/00;H03H3/007;

  • 国家 JP

  • 入库时间 2022-08-21 19:40:36

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