The lithography system, and method provides the survey instrument and the survey instrument in order which to inspect the sample

摘要

For example as for this invention abnormality, for example in regard to the pollution particle or defect the sample (the aforementioned device in order to emit the emission beam to support structure and the sample in order to support the sample, being constituted, with as the emission system which is arranged and detected the emission which is reflected from the sample with the detector, being constituted, the detection system which is arranged includes the patterning device or the mask of lithography) in regard to the survey instrument and method in order to inspect, can provide 1st and 2nd poraraiza respectively in the emission system and the detection system.