Downstream plasma etching which uses the deflection plasma beam

摘要

Topic Etching method and the etching chamber which can make the radical flow be distributed which occurs from plasma source freely are offered.SolutionsThe etching chamber (1) of etching the baseplate being the method (3) in inside making use of the plasma where the etching chamber (1) is impressed at outside, in order to make radical flow the surface of the baseplate be distributed, between etching processes, directing to the radical flow (7) which it irradiates to the baseplate (3), temporarily, you send one gas jet stream (10) from cross direction at least at least. Selective figure Figure 4