首页> 外国专利> Method for producing a fine particle array structure, method of producing the light reflecting medium, and apparatus used in these production methods

Method for producing a fine particle array structure, method of producing the light reflecting medium, and apparatus used in these production methods

机译:微粒阵列构造体的制造方法,光反射介质的制造方法以及在这些制造方法中使用的装置

摘要

PPROBLEM TO BE SOLVED: To provide a production method for particulate arrangement structure with little defect, a production method for optical media with little defect, and production apparatuses used for production thereof. PSOLUTION: The production apparatus in the figure for the particulate arrangement structure is provided with a device 5 partially speeding up vaporization rate of a dispersion medium. In this apparatus, after a particulate dispersion liquid 2 is applied on a substrate 1, the dispersion medium is quickly vaporized from the dispersion liquid 2 positioned facing the device 5, speeding up the vaporization rate of the dispersion medium, and remaining particulates are deposited on the substrate 1 to self-organizingly form a particulate assembly 3. By moving the device 5 to the dispersion liquid 2 side in conformity to the growth of the particulate assembly 3, a growth end 4 of the assembly 3 is moved to the dispersion liquid 2 side to control the growth direction of the assembly 3. PCOPYRIGHT: (C)2004,JPO&NCIPI
机译:解决的问题:提供一种缺陷少的微粒排列结构的制造方法,缺陷少的光学介质的制造方法以及用于其制造的制造装置。

解决方案:在图中用于颗粒布置结构的生产设备设有装置5,该装置部分地提高了分散介质的蒸发速率。在该设备中,在将颗粒分散液2施加到基板1上之后,分散介质从面对设备5定位的分散液2中快速蒸发,从而加快了分散介质的蒸发速率,并且剩余的颗粒沉积在其上。基板1自组织形成颗粒状组件3。通过使装置5随着颗粒状组件3的生长而向分散液2侧移动,组件3的生长端4移动至分散液2。侧面以控制组件的生长方向3.

版权所有:(C)2004,JPO&NCIPI

著录项

  • 公开/公告号JP4269215B2

    专利类型

  • 公开/公告日2009-05-27

    原文格式PDF

  • 申请/专利权人 ソニー株式会社;

    申请/专利号JP20030020124

  • 发明设计人 戸田 淳;貝野 由利子;赤尾 裕隆;

    申请日2003-01-29

  • 分类号B01J19/00;B05D1/18;B32B5/16;G02B1/02;G02B5/18;G02B5/26;G03B21/60;

  • 国家 JP

  • 入库时间 2022-08-21 19:38:41

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