首页> 外国专利> The minute pattern drawing material and the micro processing manner which uses that

The minute pattern drawing material and the micro processing manner which uses that

机译:微小图案绘制材料及其使用的微处理方式

摘要

To provide a material for minute processing and a method for minute processing using the material which realize dimensions of processing exceeding by far the limit of diffraction by using an existing low-cost laser light source and without necessitating the use of expensive and large-scale equipment. SOLUTION: The material for drawing a minute pattern has a composite layer which is composed of a layer of at least one kind of inorganic substance (A) and of a layer of at least one kind of inorganic substance (B) reacting with the inorganic substance (A) under irradiation of light and is provided ON a base. A substance produced after the reaction has an etching rate different from that of the inorganic substance (A) or (B). After the substance having the etching rate different from that of the inorganic substance (A) or (B) is produced by irradiating the material with a narrowed beam light, etching is executed with the difference in the etching rate utilized and so as to conduct the minute processing.
机译:提供用于微细加工的材料和使用该材料的微细加工方法,该材料通过使用现有的低成本激光光源而实现了远远超过衍射极限的加工尺寸,而不必使用昂贵且大型的设备。解决方案:用于绘制微​​小图案的材料具有复合层,该复合层由至少一种无机物质(A)的层和至少一种与无机物质反应的无机物质(B)的层组成(A)在光的照射下并设置在基座上。反应后产生的物质的蚀刻速率与无机物质(A)或(B)的蚀刻速率不同。在通过用窄束光照射具有与无机物质(A)或(B)不同的蚀刻速率的物质之后,利用所利用的蚀刻速率的差异执行蚀刻,从而进行蚀刻。分钟处理。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号