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摘要

PROBLEM TO BE SOLVED: To provide a CDSEM (Scanning Electron Microscope) capable of highly accurately evaluating and presenting the length measurement reproducibility of the device without being affected by fluctuations of a fine shape, which tend to increase with the miniaturization of semiconductor patterns, and provide a reproducibility evaluation method as a device.;SOLUTION: The CDSEM and the reproducibility evaluation method is provided with a function for correcting two-dimensional locational displacements of a part of which the length is to be measured in acquired enlarged length measurement images by pattern matching with a roughness template image through the use of the fine pattern shape of roughness etc. of its pattern when the length of the same part is measured a plurality of times and cutting out and acquiring enlarged length measurement region images. By canceling displacements in length measurement caused by the fine pattern shape of an object of length measurement, it is possible to present length measurement reproducibility without being affected by the object of length measurement.;COPYRIGHT: (C)2005,JPO&NCIPI