In the polycrystal MgO evaporation materials for the protecting film

摘要

PROBLEM TO BE SOLVED: To provide a polycrystalline MgO vapor deposition material by which good electric discharge responsiveness is obtainable over a wide temperature range and to provide a polycrystalline MgO material for vapor deposition which is the material used for a plasma display panel improved in panel luminance and a plasma display panel remarkably reduced in the number of address ICs without causing the degradation in the luminance of the panel.;SOLUTION: The polycrystalline MgO material for vapor deposition for a protective film of the plasma display panel is improved and the characteristic configuration thereof consists of sintered pellets of polycrystalline MgO having MgO purity of ≥99.9% and relative density of ≥90%, in which the concentration of Si included in the polycrystalline MgO is ≥30 to ≤500 ppm.;COPYRIGHT: (C)2004,JPO