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On the production mannered null plastic make optical component of the optical component

机译:在生产上习惯的空塑料制造光学元件的光学元件

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a water-repellent film by a vapor deposition method by using a fluorine-containing organic silicon compound having a high boiling point continued from the formation of an antireflection film. SOLUTION: In the method for manufacturing an optical member having a water-repellent thin film, an antireflection film is formed by vapor deposition on a plastic optical member and then the water-repellent thin film is formed by vapor deposition on the antireflection film. The vapor deposition of the water-repellent thin film is carried out by heating and vaporizing a fluorine-containing organic silicon compound under the condition that the temperature of the plastic optical member does not exceed the maximum temperature of the plastic optical member in the preceding vapor deposition for the antireflection film, and then by depositing the vaporized fluorine-containing organic silicon compound on the plastic optical member having the antireflection film. The heating stage includes a first temperature elevation stage to elevate temperature from normal temperature to a specified temperature (1) lower than the vaporization initiating temperature of the fluorine-containing silicon compound and a second temperature elevation stage to elevate temperature from the specified temperature (1) to a specified temperature (2) higher than the vaporization initiating temperature. The temperature elevation rate in the first temperature elevation stage is higher than the temperature elevation rate in the second temperature elevation stage.
机译:解决的问题:提供一种通过气相沉积法形成抗水膜的方法,该方法通过使用自形成抗反射膜以来使用的具有高沸点的含氟有机硅化合物来形成。解决方案:在具有防水薄膜的光学部件的制造方法中,通过在塑料光学部件上气相沉积形成防反射膜,然后通过在防反射膜上气相沉积来形成防水薄膜。在不使塑料光学部件的温度超过前次蒸气中的塑料光学部件的最高温度的条件下,通过加热并汽化含氟有机硅化合物来进行疏水薄膜的气相沉积。沉积抗反射膜,然后将汽化的含氟有机硅化合物沉积在具有抗反射膜的塑料光学构件上。加热阶段包括第一温度升高阶段,其将温度从常温升高至低于含氟硅化合物的汽化起始温度的特定温度(1),以及第二温度升高阶段,将温度从特定温度(1)升高)至高于汽化起始温度的规定温度(2)。第一温度升高阶段中的温度升高速率高于第二温度升高阶段中的温度升高速率。

著录项

  • 公开/公告号JP4249937B2

    专利类型

  • 公开/公告日2009-04-08

    原文格式PDF

  • 申请/专利权人 HOYA株式会社;

    申请/专利号JP20020122202

  • 发明设计人 河野 重利;

    申请日2002-04-24

  • 分类号G02B1/10;C23C14/06;C23C14/24;G02B1/11;G02B3/00;

  • 国家 JP

  • 入库时间 2022-08-21 19:37:41

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