In the exposure system which the exposure system, the exposure device and the substrate central processing unit, has with pattern formation

摘要

PPROBLEM TO BE SOLVED: To provide an exposure system, an exposure apparatus, a substrate processing apparatus, a pattern forming method, and a semiconductor device manufacturing method for enhancing the uniformity of line width of a resist film formed on a substrate. PSOLUTION: The exposure system is provided with an adjustment apparatus 52 for adjusting processing conditions of the substrate processing apparatus 50, on the basis of data related to a first line width distribution caused by the exposure apparatus, and data related to a second line width distribution caused by the substrate processing apparatus 50. PCOPYRIGHT: (C)2004,JPO&NCIPI