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ELECTROCHEMICAL SENSING AND DATA ANALYSIS SYSTEM, APPARATUS AND METHOD FOR METAL PLATING
ELECTROCHEMICAL SENSING AND DATA ANALYSIS SYSTEM, APPARATUS AND METHOD FOR METAL PLATING
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机译:电镀金属的电化学传感和数据分析系统,装置和方法
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摘要
An electrochemical sensing and data analysis system (and apparatus and methods) adapted for control of electroplating of various metal(s) on a wafer or other suitable substrate. Components of the system utilize multi-variate analysis (MVA) and galvanostatic, potentiodynamic or other electrical measurements (or combinations thereof) to predict, adjust or control plating parameters, e.g., to achieve improved yield of plated substrates with acceptable levels of defects (or lack thereof).
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