首页> 外国专利> MINIMIZING VISUAL ARTIFACTS IN A BRICK-LAYER HALFTONE STRUCTURE

MINIMIZING VISUAL ARTIFACTS IN A BRICK-LAYER HALFTONE STRUCTURE

机译:砖层半音结构中的视觉伪像最小化

摘要

What is disclosed is a novel system and method for minimizing visual artifacts, such as ROS skew and laserbeam bow, in a brick-layer halftone structure. The present method involves determining a line pattern from ROS skew and laserbeam bow profiles which traverses through successive halftone cells displacing pixels along scanlines in the process direction. The amount of displacement is varied as a function of the cross-process location as determined by the line pattern. Pixels along scanlines are shifted in a direction defined by the error profiles. In each halftone cell within which the line pattern traverses, extra pixels (empty pixel spaces created in the halftone cell by the shifting operation) are filled with lost pixels (pixels bumped from the halftone cell during the shifting operation) such that overall density of the halftone cell is maintained. The lost pixels are buffered such that lost pixels are preserved.
机译:所公开的是一种新颖的系统和方法,其用于最小化砖层半色调结构中的视觉伪像,例如ROS歪斜和激光束弓。本方法涉及从ROS偏斜和激光束弓形轮廓确定线图案,该线图案穿过连续的半色调单元,沿处理方向沿扫描线移动像素。位移量根据跨过程位置的变化而变化,该过程由线条图案确定。沿扫描线的像素在由错误轮廓定义的方向上移动。在行图案遍历的每个半色调单元中,多余的像素(通过移位操作在半色调单元中创建的空像素空间)填充有丢失的像素(在移位操作过程中从半色调单元凸出的像素),从而使半色调单元得以维持。缓冲丢失的像素,以便保留丢失的像素。

著录项

  • 公开/公告号US2009257073A1

    专利类型

  • 公开/公告日2009-10-15

    原文格式PDF

  • 申请/专利权人 HUNG M. PHAM;

    申请/专利号US20080102929

  • 发明设计人 HUNG M. PHAM;

    申请日2008-04-15

  • 分类号G06F15/00;

  • 国家 US

  • 入库时间 2022-08-21 19:36:32

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