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PHOSPHORUS-DOPED DIAMOND FILM ALLOWING SIGNIFICANTLY REDUCED ELECTRON EMISSION VOLTAGE, METHOD FOR PRODUCING THE SAME, AND ELECTRON SOURCE USING THE SAME
PHOSPHORUS-DOPED DIAMOND FILM ALLOWING SIGNIFICANTLY REDUCED ELECTRON EMISSION VOLTAGE, METHOD FOR PRODUCING THE SAME, AND ELECTRON SOURCE USING THE SAME
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机译:允许显着降低电子发射电压的掺杂磷的金刚石膜,其制造方法以及使用相同的电子源
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摘要
According to the present invention, a phosphorus-doped diamond film allowing a significantly reduced electron emission voltage, a method for producing the same, and a diamond electron source using the same, such diamond electron source exerting stable and excellent electron emission characteristics, which can be used for a cold cathode surface structure operable with low voltage, are provided. Also, a method for producing a phosphorus-doped diamond film, comprising growing a diamond film on a diamond substrate by a microwave CVD method in an atmosphere containing gases (methane and hydrogen) and phosphorus with the use of tertiary butyl phosphorus as a source of addition of phosphorous, such diamond film containing phosphorus at a concentration of 1015 cm−3 or more, having a resistivity of 107 Ωcm or less, and allowing a voltage for initiation of electron emission to be 30 V or less, and a diamond electron source using the same are provided. In such diamond film, the electron emission voltage is significantly reduced.
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机译:根据本发明,能够显着降低电子发射电压的磷掺杂金刚石膜,其制造方法以及使用该金刚石膜的金刚石电子源,该金刚石电子源发挥稳定且优异的电子发射特性,可以本发明提供了一种用于可在低电压下操作的冷阴极表面结构的结构。另外,一种制备磷掺杂的金刚石膜的方法,包括使用叔丁基磷作为来源,通过微波CVD法在包含气体(甲烷和氢)和磷的气氛中在金刚石基底上生长金刚石膜。添加磷,例如金刚石膜,其磷的浓度为10 15 Sup> cm -3 Sup>或更高,电阻率为10 7 Sup>Ωcm或本发明提供一种金刚石电子源,该金刚石电子源的电压小于或等于30V,并且用于电子发射的起始电压为30V或更低。在这样的金刚石膜中,电子发射电压显着降低。
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