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METHODOLOGY AND SYSTEM FOR DETERMINING NUMERICAL ERRORS IN PIXEL-BASED IMAGING SIMULATION IN DESIGNING LITHOGRAPHIC MASKS
METHODOLOGY AND SYSTEM FOR DETERMINING NUMERICAL ERRORS IN PIXEL-BASED IMAGING SIMULATION IN DESIGNING LITHOGRAPHIC MASKS
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机译:确定光刻模板中基于像素的成像模拟中的数值误差的方法和系统
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摘要
A method is provided for designing a mask that includes the use of a pixel-based simulation of a lithographic process model, in which test structures are designed for determining numerical and discretization errors associated with the pixel grid as opposed to other model inaccuracies. The test structure has a plurality of rows of the same sequence of features, but each row is offset from other rows along an x-direction by a multiple of a minimum step size, such as used in modifying masks during optical proximity correction. The images for each row are simulated with a lithographic model that uses the selected pixel-grid size and the differences between row images are compared. If the differences between rows exceed or violate a predetermined criterion, the pixel grid size may be modified to minimize discretization and/or numerical errors due to the choice of pixel grid size.
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